NY

Natsumi Yokokawa

FU Fujifilm: 6 patents #32 of 767Top 5%
Overall (2016): #17,939 of 481,213Top 4%
6
Patents 2016

Issued Patents 2016

Showing 1–6 of 6 patents

Patent #TitleCo-InventorsDate
9527809 Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device Hiroo Takizawa, Shuji Hirano, Wataru Nihashi, Hideaki Tsubaki 2016-12-27
9500951 Actinic ray-sensitive or radiation-sensitive composition, resist film using the same, pattern forming method, method for manufacturing electronic device, and electronic device Hiroo Takizawa, Hideaki Tsubaki 2016-11-22
9423690 Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same Hiroo Takizawa, Shuji Hirano, Wataru Nihashi 2016-08-23
9291896 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device Shuji Hirano, Hiroo Takizawa, Wataru Nihashi 2016-03-22
9291897 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device Shuji Hirano, Hiroo Takizawa, Wataru Nihashi 2016-03-22
9291898 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin Shuji Hirano, Hiroo Takizawa, Wataru Nihashi 2016-03-22