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Compound, actinic ray-sensitive or radiation-sensitive resin composition, resist film, and pattern formation method, and method for manufacturing electronic device using same, and electronic device |
Natsumi Yokokawa, Hiroo Takizawa, Shuji Hirano, Hideaki Tsubaki |
2016-12-27 |
| 9423690 |
Pattern forming method, electron beam-sensitive or extreme ultraviolet ray-sensitive resin composition, resist film, and method for manufacturing electronic device, and electronic device using the same |
Hiroo Takizawa, Shuji Hirano, Natsumi Yokokawa |
2016-08-23 |
| 9291896 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, and electronic device |
Shuji Hirano, Natsumi Yokokawa, Hiroo Takizawa |
2016-03-22 |
| 9291897 |
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device using the same, and electronic device |
Shuji Hirano, Natsumi Yokokawa, Hiroo Takizawa |
2016-03-22 |
| 9291898 |
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same, pattern forming method, manufacturing method of electronic device, electronic device and resin |
Natsumi Yokokawa, Shuji Hirano, Hiroo Takizawa |
2016-03-22 |