Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494718 | Mirror for the EUV wavelength range, substrate for such a mirror, projection objective for microlithography comprising such a mirror or such a substrate, and projection exposure apparatus for microlithography comprising such a projection objective | Stephan Muellender, Joern WEBER, Wilfried Clauss, Hans-Jochen Paul, Gerhard Braun +4 more | 2016-11-15 |
| 9229331 | EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method | Dirk Heinrich Ehm | 2016-01-05 |