Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9354529 | Arrangement for use in a projection exposure tool for microlithography having a reflective optical element | Maarten Van Kampen, Stefan Schmidt, Vadim Yevgenyevich Banine, Erik Roelof Loopstra | 2016-05-31 |
| 9341756 | Method for correcting the surface form of a mirror | Juergen Mueller, Thomas Schicketanz | 2016-05-17 |
| 9298109 | EUV lithography apparatus and method for detecting particles in an EUV lithography apparatus | Vera Butscher | 2016-03-29 |
| 9249501 | Surface correction on coated mirrors | Franz-Josef Stickel, Juergen Mueller | 2016-02-02 |
| 9229331 | EUV mirror comprising an oxynitride capping layer having a stable composition, EUV lithography apparatus, and operating method | Gisela Von Blanckenhagen | 2016-01-05 |