Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9373485 | Apparatus and method for improved darkspace gap design in RF sputtering chamber | Xianmin Tang | 2016-06-21 |
| 9355819 | Elongated capacitively coupled plasma source for high temperature low pressure environments | Joseph Yudovsky, Garry K. Kwong, Tai T. Ngo, Kevin Griffin, Kenneth S. Collins +1 more | 2016-05-31 |
| 9269562 | In situ chamber clean with inert hydrogen helium mixture during wafer process | Robert Dinsmore, Song-Moon Suh, Cheng-Hsiung Tsai, Glen T. Mori | 2016-02-23 |