HN

Hiroyuki Nakayama

TL Tokyo Electron Limited: 4 patents #46 of 712Top 7%
HO Hoya: 2 patents #35 of 218Top 20%
KA Kao: 1 patents #68 of 338Top 25%
Overall (2011): #8,567 of 364,097Top 3%
7
Patents 2011

Issued Patents 2011

Showing 1–7 of 7 patents

Patent #TitleCo-InventorsDate
8057600 Method and apparatus for an improved baffle plate in a plasma processing system Shinya Nishimoto, Kouji Mitsuhashi 2011-11-15
8053014 Liquid seasoning Shin Koike, Koichi Okisaka, Jun Kohori, Yoko Seo, Noboru Shirahata +2 more 2011-11-08
8048235 Gate valve cleaning method and substrate processing system Tsuyoshi Moriya, Keisuke Kondoh, Hiroki Oka 2011-11-01
8029871 Method for producing silica aerogel coating Kazuhiro Yamada, Yasuhiro Sakai, Maki Yamada 2011-10-04
7931940 Production method of silica aerogel film, anti-reflection coating and optical element Mineta SUZUKI, Takanobu Shiokawa, Kazuhiro Yamada, Hideki Yamaguchi, Ayako Maruta 2011-04-26
7892361 In-chamber member, a cleaning method therefor and a plasma processing apparatus Nobuyuki Nagayama, Kouji Mitsuhashi 2011-02-22
7883779 Vacuum apparatus including a particle monitoring unit, particle monitoring method and program, and window member for use in the particle monitoring Tsuyoshi Moriya 2011-02-08