Issued Patents 2011
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8078996 | Method and system for correcting a mask pattern design | Kyoko Izuha, Shigeki Nojima, Satoshi Tanaka | 2011-12-13 |
| 8065637 | Semiconductor device | — | 2011-11-22 |
| 8046722 | Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor device | Satoshi Tanaka, Soichi Inoue | 2011-10-25 |
| 8042067 | Pattern forming method and system, and method of manufacturing a semiconductor device | Ayako Nakano | 2011-10-18 |
| 7998642 | Mask pattern data creation method and mask | Chikaaki Kodama, Hirotaka Ichikawa, Kazuyuki Masukawa | 2011-08-16 |
| 7996794 | Mask data processing method for optimizing hierarchical structure | Sachiko Kobayashi, Shinichiroh Ohki, Hirotaka Ichikawa | 2011-08-09 |
| 7984390 | Data processing method in semiconductor device, program of the same, and manufacturing method of semiconductor device | Ayako Nakano, Atsushi Watanabe | 2011-07-19 |
| 7966584 | Pattern-producing method for semiconductor device | Suigen Kyoh, Soichi Inoue | 2011-06-21 |
| 7949967 | Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method | Shigeki Nojima, Shimon Maeda | 2011-05-24 |
| 7941767 | Photomask management method and photomask wash limit generating method | Hidefumi Mukai, Shinji Yamaguchi, Yukiyasu Arisawa | 2011-05-10 |
| 7934175 | Parameter adjustment method, semiconductor device manufacturing method, and recording medium | Yasunobu Kai, Soichi Inoue, Satoshi Tanaka, Shigeki Nojima, Kazuyuki Masukawa +1 more | 2011-04-26 |
| RE42302 | Method for making a design layout and mask | Satoshi Tanaka, Soichi Inoue | 2011-04-19 |
| RE42294 | Semiconductor integrated circuit designing method and system using a design rule modification | Satoshi Tanaka, Soichi Inoue | 2011-04-12 |
| 7925090 | Method of determining photo mask, method of manufacturing semiconductor device, and computer program product | Kazuya Fukuhara, Kyoko Izuha | 2011-04-12 |
| 7903264 | Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatus | Kei Hayasaki, Toru Mikami, Shinichi Ito, Yuichiro Yamazaki | 2011-03-08 |