Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8078996 | Method and system for correcting a mask pattern design | Kyoko Izuha, Toshiya Kotani, Satoshi Tanaka | 2011-12-13 |
| 7949967 | Design Pattern correcting method, process proximity effect correcting method, and semiconductor device manufacturing method | Toshiya Kotani, Shimon Maeda | 2011-05-24 |
| 7934175 | Parameter adjustment method, semiconductor device manufacturing method, and recording medium | Toshiya Kotani, Yasunobu Kai, Soichi Inoue, Satoshi Tanaka, Kazuyuki Masukawa +1 more | 2011-04-26 |
| 7895541 | Semiconductor integrated circuit pattern verification method, photomask manufacturing method, semiconductor integrated circuit device manufacturing method, and program for implementing semiconductor integrated circuit pattern verification method | — | 2011-02-22 |
| 7890908 | Method for verifying mask pattern data, method for manufacturing mask, mask pattern verification program, and method for manufacturing semiconductor device | Yoko Oikawa, Satoshi Tanaka | 2011-02-15 |