Issued Patents 2011
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7981594 | Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Hwan-Sung Cheon, Chang Il Oh +1 more | 2011-07-19 |
| 7879526 | Hardmask compositions for resist underlayer films | Dong Seon Uh, Chang Il Oh, Do-Hyeon Kim, Hui-Chan Yun, Irina Nam +1 more | 2011-02-01 |
| 7862990 | Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer | Kyong Ho Yoon, Jong-seob Kim, Dong Seon Uh, Chang Il Oh, Kyung-Hee HYUNG +1 more | 2011-01-04 |