JK

Jong-seob Kim

Samsung: 7 patents #425 of 8,673Top 5%
CI Cheil Industries: 5 patents #3 of 178Top 2%
Overall (2011): #2,291 of 364,097Top 1%
12
Patents 2011

Issued Patents 2011

Showing 1–12 of 12 patents

Patent #TitleCo-InventorsDate
8058711 Filler for filling a gap and method for manufacturing semiconductor capacitor using the same Sang-Hak Lim, Hui-Chan Yun, Dong Il Han, Taek-Soo Kwak, Jin-Hee Bae +2 more 2011-11-15
8018781 Method of operating nonvolatile memory device Kwang Soo Seol, Sang Jin Park, Sung Hoon Lee, Sung Il Park, Jung-Dal Choi +3 more 2011-09-13
8004906 Nonvolatile memory device and method of operating and fabricating the same Ki-ha Hong, Sung Hoon Lee, Jae-woong Hyun, Jai-kwang Shin, Young-gu Jin +1 more 2011-08-23
7981594 Hardmask composition having antirelective properties and method of patterning material on susbstrate using the same Kyong Ho Yoon, Dong Seon Uh, Hwan-Sung Cheon, Chang Il Oh, Min Soo Kim +1 more 2011-07-19
7978006 Quantum interference transistors and methods of manufacturing and operating the same Jai-kwang Shin, Sun-ae Seo, Ki-ha Hong, Hyun-jong Chung 2011-07-12
7955562 Chemical sensor using thin-film sensing member Ki-ha Hong, Hyuk-soon Choi, Jai-kwang Shin 2011-06-07
7947795 Polymer for filling gaps in semiconductor substrate and coating composition using the same Hyun Hoo Sung, Sun Yul Lee, Seung-Bae Oh, Dae Yun Kim 2011-05-24
7936028 Spin field effect transistor using half metal and method of manufacturing the same Ki-ha Hong, Sung Hoon Lee, Jai-kwang Shin 2011-05-03
7929349 Method of operating nonvolatile memory device Kwang Soo Seol, Sang Jin Park, Sung Hoon Lee, Sung Il Park 2011-04-19
7919786 Nanowire light emitting device Young-gu Jin, Sung Hoon Lee, Hyo-sug Lee, Byoung-lyong Choi 2011-04-05
7879526 Hardmask compositions for resist underlayer films Dong Seon Uh, Chang Il Oh, Do-Hyeon Kim, Hui-Chan Yun, Jin Kuk Lee +1 more 2011-02-01
7862990 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer Kyong Ho Yoon, Dong Seon Uh, Chang Il Oh, Kyung-Hee HYUNG, Min Soo Kim +1 more 2011-01-04