Issued Patents 2011
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8012366 | Process for etching a transparent workpiece including backside endpoint detection steps | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Madhavi R. Chandrachood, Ajay Kumar | 2011-09-06 |
| 8002946 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Madhavi R. Chandrachood, Ajay Kumar | 2011-08-23 |
| 7967930 | Plasma reactor for processing a workpiece and having a tunable cathode | Richard Lewington, Michael N. Grimbergen, Khiem K. Nguyen, Madhavi R. Chandrachood, Ajay Kumar | 2011-06-28 |
| 7964818 | Method and apparatus for photomask etching | Elmira Ryabova, Richard Lewington, Madhavi R. Chandrachood, Amitabh Sabharwal | 2011-06-21 |
| 7943005 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2011-05-17 |
| 7909961 | Method and apparatus for photomask plasma etching | Ajay Kumar, Madhavi R. Chandrachood, Richard Lewington, Amitabh Sabharwal, Sheeba J. Panayil +1 more | 2011-03-22 |