Issued Patents 2011
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8017029 | Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside | Madhavi R. Chandrachood, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-09-13 |
| 8012366 | Process for etching a transparent workpiece including backside endpoint detection steps | Richard Lewington, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-09-06 |
| 8002946 | Mask etch plasma reactor with cathode providing a uniform distribution of etch rate | Richard Lewington, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-08-23 |
| 7976671 | Mask etch plasma reactor with variable process gas distribution | Madhavi R. Chandrachood, Khiem K. Nguyen, Richard Lewington, Ibrahim M. Ibrahim, Sheeba J. Panayil +1 more | 2011-07-12 |
| 7967930 | Plasma reactor for processing a workpiece and having a tunable cathode | Richard Lewington, Khiem K. Nguyen, Darin Bivens, Madhavi R. Chandrachood, Ajay Kumar | 2011-06-28 |