Issued Patents 2011
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7998823 | Method for reducing leakage currents caused by misalignment of a contact structure by increasing an error tolerance of the contact patterning process | Kai Frohberg, Ralf Richter | 2011-08-16 |
| 7928004 | Nano imprint technique with increased flexibility with respect to alignment and feature shaping | Robert Seidel, Frank Feustel | 2011-04-19 |
| 7915170 | Reducing contamination of semiconductor substrates during beol processing by providing a protection layer at the substrate edge | Su Ruo Qing, Frank Feustel | 2011-03-29 |
| 7910496 | Technique for forming an interlayer dielectric material of increased reliability above a structure including closely spaced lines | Frank Feustel, Kai Frohberg | 2011-03-22 |
| 7906815 | Increased reliability for a contact structure to connect an active region with a polysilicon line | Ralf Richter, Kai Frohberg | 2011-03-15 |
| 7902581 | Semiconductor device comprising a contact structure based on copper and tungsten | Kai Frohberg, Thomas Werner | 2011-03-08 |
| 7879709 | Semiconductor structure comprising an electrically conductive feature and method of forming a semiconductor structure | Frank Feustel, Tobias Letz | 2011-02-01 |
| 7875514 | Technique for compensating for a difference in deposition behavior in an interlayer dielectric material | Ralf Richter, Robert Seidel | 2011-01-25 |