Issued Patents 2005
Showing 26–50 of 61 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6911381 | Boron incorporated diffusion barrier material | Vishnu K. Agarwal | 2005-06-28 |
| 6908639 | Mixed composition interface layer and method of forming | Cem Basceri | 2005-06-21 |
| 6902985 | Method of forming a rough (high surface area) electrode from Ti and TiN capacitors and semiconductor devices including same | Garo Derderian | 2005-06-07 |
| 6903010 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | Trung T. Doan, Tyler Lowrey | 2005-06-07 |
| 6903014 | Low temperature reflow method for filling high aspect ratio contacts | Shubneesh Batra | 2005-06-07 |
| 6903462 | Chemical vapor deposition of titanium | Donald L. Westmoreland | 2005-06-07 |
| 6900515 | Use of DAR coating to modulate the efficiency of laser fuse blows | Mark Fischer, Zhiping Yin, Thomas R. Glass, Kunal R. Parekh | 2005-05-31 |
| 6900496 | Capacitor constructions | Pierre C. Fazan | 2005-05-31 |
| 6896737 | Gas delivery device for improved deposition of dielectric material | — | 2005-05-24 |
| 6896730 | Atomic layer deposition apparatus and methods | Garo Derderian, Cem Basceri, Demetrius Sarigiannis | 2005-05-24 |
| 6893506 | Atomic layer deposition apparatus and method | Trung T. Doan | 2005-05-17 |
| 6890596 | Deposition methods | Demetrius Sarigiannis, Garo Derderian, Cem Basceri, F. Daniel Gealy, Chris M. Carlson | 2005-05-10 |
| 6890842 | Method of forming a thin film transistor | Shubneesh Batra, Pierre C. Fazan | 2005-05-10 |
| 6890814 | Methods for use in forming a capacitor and structures resulting from same | Garo Derderian | 2005-05-10 |
| 6888212 | Method for trench isolation by selective deposition of low temperature oxide films | Ravi Iyer, Pai-Hung Pan | 2005-05-03 |
| 6884716 | Method of forming a crystalline phase material | Sujit Sharan | 2005-04-26 |
| 6884296 | Reactors having gas distributors and methods for depositing materials onto micro-device workpieces | Cem Basceri | 2005-04-26 |
| 6881667 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | Trung T. Doan, Tyler Lowrey | 2005-04-19 |
| 6878602 | Dielectric cure for reducing oxygen vacancies | Cem Basceri | 2005-04-12 |
| 6869877 | Integrated capacitors fabricated with conductive metal oxides | Howard E. Rhodes, Mark Visokay, Tom Graettinger, Dan Gealy, Cem Basceri +1 more | 2005-03-22 |
| 6864125 | Process for growing a dielectric layer on a silicon-containing surface using a mixture of N2O and O3 | Randhir P. S. Thakur | 2005-03-08 |
| 6861330 | Structures and methods for enhancing capacitors in integrated circuits | Cem Basceri | 2005-03-01 |
| 6861726 | Apparatus having trench isolation structure with reduced isolation pad height and edge spacer | Pierre C. Fazan | 2005-03-01 |
| 6861351 | Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer | Trung T. Doan, Tyler Lowrey | 2005-03-01 |
| 6861094 | Methods for forming thin layers of materials on micro-device workpieces | Garo Derderian | 2005-03-01 |