GS

Gurtej S. Sandhu

Micron: 61 patents #2 of 861Top 1%
📍 Boise, ID: #1 of 564 inventorsTop 1%
🗺 Idaho: #1 of 1,002 inventorsTop 1%
Overall (2005): #5 of 245,428Top 1%
61
Patents 2005

Issued Patents 2005

Showing 1–25 of 61 patents

Patent #TitleCo-InventorsDate
6977221 Methods of forming an electrically conductive line Sujit Sharan 2005-12-20
6967154 Enhanced atomic layer deposition Shuang Meng, Garo Derderian 2005-11-22
6962824 Method for controlling deposition of dielectric films Cem Basceri, Dan Gealy 2005-11-08
6953743 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer Trung T. Doan, Tyler Lowrey 2005-10-11
6952051 Interlevel dielectric structure Anand Srinivasan, Ravi Iyer 2005-10-04
6949827 Semiconductor device with novel film composition Garo Derderian 2005-09-27
6946357 Conductive container structures having a dielectric cap Alan R. Reinberg 2005-09-20
6946393 Small grain size, conformal aluminum interconnects and method for their formation Wing-Cheong Gilbert Lai 2005-09-20
6943107 Methods of forming a refractory metal silicide Sujit Sharan 2005-09-13
6940172 Chemical vapor deposition of titanium Donald L. Westmoreland 2005-09-06
6939794 Boron-doped amorphous carbon film for use as a hard etch mask during the formation of a semiconductor device Zhiping Yin 2005-09-06
6939723 Method of forming haze-free BST films Cem Basceri 2005-09-06
6939817 Removal of carbon from an insulative layer using ozone Li Li 2005-09-06
6940112 Integrated capacitors fabricated with conductive metal oxides Howard E. Rhodes, Mark Visokay, Tom Graettinger, Dan Gealy, Cem Basceri +1 more 2005-09-06
6936539 Antireflective coating for use during the manufacture of a semiconductor device Zhiping Yin 2005-08-30
6936549 Chemical vapor deposition using organometallic precursors Pierre C. Fazan 2005-08-30
6935372 Semiconductor processing reactive precursor valve assembly Ross S. Dando, Allen Mardian 2005-08-30
6930058 Method of depositing a silicon dioxide comprising layer doped with at least one of P, B and Ge Chris Hill, Weimin Li 2005-08-16
6927067 Detection devices, methods and systems for gas phase materials 2005-08-09
6924968 Haze-free BST films Cem Basceri 2005-08-02
6921708 Integrated circuits having low resistivity contacts and the formation thereof using an in situ plasma doping and clean Sujit Sharan 2005-07-26
6921728 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds 2005-07-26
6916374 Atomic layer deposition methods and atomic layer deposition tools Trung T. Doan 2005-07-12
6916380 System for depositing a layered film Haining Yang 2005-07-12
6917112 Conductive semiconductor structures containing metal oxide regions Cem Basceri 2005-07-12