Issued Patents 2005
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6954275 | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography | Byung-Jin Choi, S. Sreenivasan, C. Grant Willson, Todd C. Bailey, John Ekerdt | 2005-10-11 |
| 6930034 | Robust ultra-low k interconnect structures using bridge-then-metallization fabrication sequence | Elbert E. Huang, Satyanarayana V. Nitta, Sampath Purushothaman, Katherine L. Saenger | 2005-08-16 |
| 6921615 | High-resolution overlay alignment methods for imprint lithography | Sidlgata V. Sreenivasan, Byung-Jin Choi, Todd C. Bailey | 2005-07-26 |
| 6919152 | High resolution overlay alignment systems for imprint lithography | S. Sreenivasan, Byung-Jin Choi, Todd C. Bailey | 2005-07-19 |
| 6916585 | Method of varying template dimensions to achieve alignment during imprint lithography | Sidlgata V. Sreenivasan, Byung-Jin Choi, Todd C. Bailey | 2005-07-12 |
| 6911400 | Nonlithographic method to produce self-aligned mask, articles produced by same and compositions for same | Stephen M. Gates, Jeffrey Hedrick, Elbert E. Huang, Satyanarayana V. Nitta, Sampath Purushothaman +1 more | 2005-06-28 |
| 6902853 | Dual wavelength method of determining a relative position of a substrate and a template | Sidlgata V. Sreenivasan, Byung-Jin Choi, Todd C. Bailey | 2005-06-07 |
| 6842229 | Imprint lithography template comprising alignment marks | Sidlgata V. Sreenivasan, Byung-Jin Choi, Todd C. Bailey | 2005-01-11 |