Issued Patents 2005
Showing 1–17 of 17 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6980282 | Method for modulating shapes of substrates | Ronald D. Voisin, Sidlgata V. Sreenivasan, Michael Watts, C. Grant Willson, Norman E. Schumaker +1 more | 2005-12-27 |
| 6955868 | Method to control the relative position between a body and a surface | Sidlgata V. Sreenivasan, Stephen C. Johnson | 2005-10-18 |
| 6954275 | Methods for high-precision gap and orientation sensing between a transparent template and substrate for imprint lithography | Matthew E. Colburn, S. Sreenivasan, C. Grant Willson, Todd C. Bailey, John Ekerdt | 2005-10-11 |
| 6951173 | Assembly and method for transferring imprint lithography templates | Mario Johannes Meissl | 2005-10-04 |
| 6932934 | Formation of discontinuous films during an imprint lithography process | Mario Johannes Meissl, Sidlagata V. Sreenivasan, Michael Watts | 2005-08-23 |
| 6926929 | System and method for dispensing liquids | Michael Watts, Sidlgata V. Sreenivasan | 2005-08-09 |
| 6922906 | Apparatus to orientate a body with respect to a surface | Sidlgata V. Sreenivasan, Stephen C. Johnson | 2005-08-02 |
| 6921615 | High-resolution overlay alignment methods for imprint lithography | Sidlgata V. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2005-07-26 |
| 6919152 | High resolution overlay alignment systems for imprint lithography | S. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2005-07-19 |
| 6916585 | Method of varying template dimensions to achieve alignment during imprint lithography | Sidlgata V. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2005-07-12 |
| 6916584 | Alignment methods for imprint lithography | Sidlgata V. Sreenivasan, Michael Watts, Ronald D. Voisin | 2005-07-12 |
| 6902853 | Dual wavelength method of determining a relative position of a substrate and a template | Sidlgata V. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2005-06-07 |
| 6900881 | Step and repeat imprint lithography systems | Sidlgata V. Sreenivasan, Michael Watts, Mario Johannes Meissl, Norman E. Schumaker, Ronald D. Voisin | 2005-05-31 |
| 6871558 | Method for determining characteristics of substrate employing fluid geometries | Sidlgata V. Sreenivasan | 2005-03-29 |
| 6873087 | High precision orientation alignment and gap control stages for imprint lithography processes | Sidlgata V. Sreenivasan, Stephen C. Johnson | 2005-03-29 |
| 6870301 | Method of separating a template from a substrate during imprint lithography | Sidlgata V. Sreenivasan, Stephen C. Johnson | 2005-03-22 |
| 6842229 | Imprint lithography template comprising alignment marks | Sidlgata V. Sreenivasan, Matthew E. Colburn, Todd C. Bailey | 2005-01-11 |