Issued Patents 2005
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6944578 | Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus | Reginald R. Bowley, Jr., Vincent J. Carlos, James Doran, Stephen E. Knight, Robert K. Leidy +2 more | 2005-09-13 |
| 6917901 | Contact hole profile and line edge width metrology for critical image control and feedback of lithographic focus | Reginald R. Bowley, Jr., Vincent J. Carlos, James Doran, Stephen E. Knight, Robert K. Leidy +2 more | 2005-07-12 |
| 6856378 | Method of photolithographic exposure dose control as a function of resist sensitivity | Matthew Nicholls, Charles J. Parrish, Craig E. Schneider, Charles A. Whiting | 2005-02-15 |