Issued Patents 2005
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6972237 | Lateral heterojunction bipolar transistor and method of manufacture using selective epitaxial growth | Purakh Raj Verma, Shao-fu Sanford Chu, Jia Zhen Zheng, Jian Xun Li | 2005-12-06 |
| 6962850 | Process to manufacture nonvolatile MOS memory device | Vincent Ho, Wee Kiong Choi, Wai Kin Chim, Vivian Ng, Cheng Lin Heng +1 more | 2005-11-08 |
| 6924202 | Heterojunction bipolar transistor with self-aligned emitter and sidewall base contact | Jian Xun Li, Purakh Raj Verma, Jia Zhen Zheng, Shao-fu Sanford Chu | 2005-08-02 |
| 6908824 | Self-aligned lateral heterojunction bipolar transistor | Jian Xun Li, Purakh Raj Verma, Jia Zhen Zheng, Shao-fu Sanford Chu | 2005-06-21 |
| 6903013 | Method to fill a trench and tunnel by using ALD seed layer and electroless plating | Sanford Chu, Chit Hwei Ng, Yong Ju, Jia Zhen Zheng | 2005-06-07 |
| 6899857 | Method for forming a region of low dielectric constant nanoporous material using a microemulsion technique | Soo Choi Pheng, Wang Cui Yang, Siew Yong Kong, Alex See | 2005-05-31 |
| 6890854 | Method and apparatus for performing nickel salicidation | Pooi See Lee, Kin Leong Pey, Alex See | 2005-05-10 |
| 6881976 | Heterojunction BiCMOS semiconductor | Jia Zhen Zheng, Shao-fu Sanford Chu | 2005-04-19 |
| 6878623 | Technique to achieve thick silicide film for ultra-shallow junctions | Cheng Tan, Randall Cher Liang Cha, Alex See | 2005-04-12 |
| 6869884 | Process to reduce substrate effects by forming channels under inductor devices and around analog blocks | Sanford Chu, Chit Hwei Ng, Purakh Raj Verma, Jia Zhen Zheng, Johnny Kok Wai Chew +1 more | 2005-03-22 |
| 6869857 | Method to achieve STI planarization | Feng-Wei Dai, Pang Choong Hau, Peter Hing | 2005-03-22 |
| 6861317 | Method of making direct contact on gate by using dielectric stop layer | Purakh Raj Verma, Sanford Chu, Yelehanka Ramachandramurthy Pradeep, Kai Shao, Jia Zhen Zheng | 2005-03-01 |
| 6852605 | Method of forming an inductor with continuous metal deposition | Chit Hwei Ng, Purakh Raj Verma, Yelehanka Ramachandramurthy Pradeep, Sanford Chu | 2005-02-08 |