HR

Hartmut Ruelke

AM AMD: 2 patents #222 of 906Top 25%
Overall (2005): #54,597 of 245,428Top 25%
2
Patents 2005

Issued Patents 2005

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6927161 Low-k dielectric layer stack including an etch indicator layer for use in the dual damascene technique Christof Streck, Georg Sulzer 2005-08-09
6893956 Barrier layer for a copper metallization layer including a low-k dielectric Joerg Hohage, Thomas Werner, Massud Aminpur 2005-05-17