TW

Thomas Werner

AM AMD: 3 patents #140 of 906Top 20%
📍 Radebeul, IL: #1 of 1 inventorsTop 100%
Overall (2005): #15,678 of 245,428Top 7%
3
Patents 2005

Issued Patents 2005

Showing 1–3 of 3 patents

Patent #TitleCo-InventorsDate
6964874 Void formation monitoring in a damascene process Peter Hübler, Frank Koschinsky 2005-11-15
6893956 Barrier layer for a copper metallization layer including a low-k dielectric Hartmut Ruelke, Joerg Hohage, Massud Aminpur 2005-05-17
6867610 Test structure for determining the stability of electronic devices comprising connected substrates Mathias Bottcher 2005-03-15