Issued Patents 2005
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6949481 | Process for fabrication of spacer layer with reduced hydrogen content in semiconductor device | Arvind Halliyal, Rinji Sugino, Hidehiko Shiraiwa, Tazrien Kamal, Jean Y. Yang | 2005-09-27 |