Issued Patents 2004
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835639 | Multiple work function gates | Mark Visokay | 2004-12-28 |
| 6821873 | Anneal sequence for high-&kgr; film property optimization | Mark Visokay, Luigi Colombo | 2004-11-23 |
| 6809370 | High-k gate dielectric with uniform nitrogen profile and methods for making the same | Luigi Colombo, Manuel Quevedo-Lopez, James Joseph Chambers, Mark Visokay | 2004-10-26 |
| 6803611 | Use of indium to define work function of p-type doped polysilicon | James Joseph Chambers, Amitabh Jain | 2004-10-12 |
| 6794252 | Method and system for forming dual work function gate electrodes in a semiconductor device | Mark Visokay | 2004-09-21 |
| 6787425 | Methods for fabricating transistor gate structures | Trace Hurd, Stephanie W. Butler, Majid Mansoori | 2004-09-07 |
| 6780719 | Method for annealing ultra-thin, high quality gate oxide layers using oxidizer/hydrogen mixtures | Hiroaki Niimi, Rajesh Khamankar, James Joseph Chambers, Sunil Hattangady | 2004-08-24 |
| 6770521 | Method of making multiple work function gates by implanting metals with metallic alloying additives | Mark Visokay, Luigi Colombo | 2004-08-03 |
| 6750126 | Methods for sputter deposition of high-k dielectric films | Mark Visokay, James Joseph Chambers, Luigi Colombo | 2004-06-15 |
| 6727185 | Dry process for post oxide etch residue removal | Patricia B. Smith, David B. Aldrich, Eric C. Williams | 2004-04-27 |
| 6696332 | Bilayer deposition to avoid unwanted interfacial reactions during high K gate dielectric processing | Mark Visokay, Luigi Colombo | 2004-02-24 |