Issued Patents 2004
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6812073 | Source drain and extension dopant concentration | Haowen Bu, Wayne Bather, Stephanie W. Butler | 2004-11-02 |
| 6808997 | Complementary junction-narrowing implants for ultra-shallow junctions | Stephanie W. Butler | 2004-10-26 |
| 6803611 | Use of indium to define work function of p-type doped polysilicon | Antonio Luis Pacheco Rotondaro, James Joseph Chambers | 2004-10-12 |
| 6797593 | Methods and apparatus for improved mosfet drain extension activation | Srinivasan Chakravarthi, Xin Zhang | 2004-09-28 |
| 6743705 | Transistor with improved source/drain extension dopant concentration | Manoj Mehrotra, Haowen Bu | 2004-06-01 |
| 6737354 | Method of CMOS source/drain extension with the PMOS implant spaced by poly oxide and cap oxide from the gates | Donald Miles, Douglas T. Grider, Chidi Chidambaram | 2004-05-18 |
| 6713360 | System for reducing segregation and diffusion of halo implants into highly doped regions | Kaiping Liu, Zhiqiang Wu | 2004-03-30 |
| 6709938 | Source/drain extension fabrication process with direct implantation | Donald Miles, Douglas T. Grider, P.R. Chidambaram | 2004-03-23 |
| 6677201 | Method of fabricating thermal CVD oxynitride and BTBAS nitride sidewall spacer for metal oxide semiconductor transistors | Haowen Bu | 2004-01-13 |