Issued Patents 2004
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6812073 | Source drain and extension dopant concentration | Amitabh Jain, Wayne Bather, Stephanie W. Butler | 2004-11-02 |
| 6806149 | Sidewall processes using alkylsilane precursors for MOS transistor fabrication | Malcolm J. Bevan | 2004-10-19 |
| 6743705 | Transistor with improved source/drain extension dopant concentration | Manoj Mehrotra, Amitabh Jain | 2004-06-01 |
| 6677201 | Method of fabricating thermal CVD oxynitride and BTBAS nitride sidewall spacer for metal oxide semiconductor transistors | Amitabh Jain | 2004-01-13 |