Issued Patents 2004
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828200 | Multistage deposition that incorporates nitrogen via an intermediate step | Mark Visokay, Luigi Colombo | 2004-12-07 |
| 6809370 | High-k gate dielectric with uniform nitrogen profile and methods for making the same | Luigi Colombo, Manuel Quevedo-Lopez, Mark Visokay, Antonio Luis Pacheco Rotondaro | 2004-10-26 |
| 6803611 | Use of indium to define work function of p-type doped polysilicon | Antonio Luis Pacheco Rotondaro, Amitabh Jain | 2004-10-12 |
| 6780719 | Method for annealing ultra-thin, high quality gate oxide layers using oxidizer/hydrogen mixtures | Hiroaki Niimi, Rajesh Khamankar, Sunil Hattangady, Antonio Luis Pacheco Rotondaro | 2004-08-24 |
| 6762114 | Methods for transistor gate fabrication and for reducing high-k gate dielectric roughness | — | 2004-07-13 |
| 6750126 | Methods for sputter deposition of high-k dielectric films | Mark Visokay, Luigi Colombo, Antonio Luis Pacheco Rotondaro | 2004-06-15 |