Issued Patents 2004
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6828200 | Multistage deposition that incorporates nitrogen via an intermediate step | James Joseph Chambers, Mark Visokay | 2004-12-07 |
| 6828161 | Method of forming an FeRAM having a multi-layer hard mask and patterning thereof | Scott R. Summerfelt, Sanjeev Aggarwal, Theodore S. Moise, J. Scott Martin | 2004-12-07 |
| 6821873 | Anneal sequence for high-&kgr; film property optimization | Mark Visokay, Antonio Luis Pacheco Rotondaro | 2004-11-23 |
| 6809370 | High-k gate dielectric with uniform nitrogen profile and methods for making the same | Manuel Quevedo-Lopez, James Joseph Chambers, Mark Visokay, Antonio Luis Pacheco Rotondaro | 2004-10-26 |
| 6797599 | Gate structure and method | Mark Visokay, Antonio Rotondaro | 2004-09-28 |
| 6783997 | Gate structure and method | Antonio Rotondaro, Mark Visokay | 2004-08-31 |
| 6770521 | Method of making multiple work function gates by implanting metals with metallic alloying additives | Mark Visokay, Antonio Luis Pacheco Rotondaro | 2004-08-03 |
| 6750126 | Methods for sputter deposition of high-k dielectric films | Mark Visokay, James Joseph Chambers, Antonio Luis Pacheco Rotondaro | 2004-06-15 |
| 6709875 | Contamination control for embedded ferroelectric device fabrication processes | Stephen Roy Gilbert, Trace Hurd, Laura Wills Mirkarimi, Scott R. Summerfelt | 2004-03-23 |
| 6696332 | Bilayer deposition to avoid unwanted interfacial reactions during high K gate dielectric processing | Mark Visokay, Antonio Luis Pacheco Rotondaro | 2004-02-24 |