Issued Patents 2004
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6835532 | Organic anti-reflective coating composition and method for forming photoresist patterns using the same | — | 2004-12-28 |
| 6824951 | Photoresist composition for resist flow process | Geun Su Lee, Jin-Soo Kim, Min Ho Jung, Ki Ho Baik | 2004-11-30 |
| 6818376 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Ki Ho Baik | 2004-11-16 |
| 6811960 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2004-11-02 |
| 6808859 | ArF photoresist copolymers | Cheol Kyu Bok, Ki Ho Baik | 2004-10-26 |
| 6806025 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | Geun Su Lee, Ki Soo Shin | 2004-10-19 |
| 6797451 | Reflection-inhibiting resin used in process for forming photoresist pattern | Sung-Eun Hong, Min Ho Jung, Hyeong Soo Kim, Ki Ho Baik | 2004-09-28 |
| 6787285 | Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator | Keun Kyu Kong, Gyu-Dong Park, Ki Soo Shin | 2004-09-07 |
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Geun Su Lee, Ki Ho Baik | 2004-08-03 |
| 6770415 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | Geun Su Lee, Cha-Won Koh, Min Ho Jung, Ki Ho Baik | 2004-08-03 |
| 6770720 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong, Ki Ho Baik | 2004-08-03 |
| 6764806 | Over-coating composition for photoresist, and processes for forming photoresist patterns using the same | Keun Kyu Kong, Cha-Won Koh, Jin-Soo Kim, Ki Ho Baik | 2004-07-20 |
| 6764964 | Method for forming patterns of a semiconductor device | Young Sun Hwang, Sung Koo Lee, Chcol-kyu Bok, Ki Soo Shin | 2004-07-20 |
| 6753448 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Ki Ho Baik | 2004-06-22 |
| 6753128 | Photoresist additive for preventing acid migration and photoresist composition comprising the same | Geun Su Lee, Ki Soo Shin | 2004-06-22 |
| 6749990 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | Geun Su Lee, Ki Soo Shin | 2004-06-15 |
| 6737217 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Geun Su Lee, Ki Soo Shin | 2004-05-18 |
| 6720129 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | Geun Su Lee, Ki Soo Shin | 2004-04-13 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Geun Su Lee, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +2 more | 2004-03-02 |
| 6692891 | Photoresist composition containing photo radical generator with photoacid generator | Geun Su Lee, Min Ho Jung, Ki Ho Baik | 2004-02-17 |
| 6686123 | Photoresist monomer, polymer thereof and photoresist composition containing the same | Geun Su Lee, Min Ho Jung | 2004-02-03 |