Issued Patents 2004
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6797451 | Reflection-inhibiting resin used in process for forming photoresist pattern | Min Ho Jung, Hyeong Soo Kim, Jae Chang Jung, Ki Ho Baik | 2004-09-28 |
| 6780953 | Organic polymer for anti-reflective coating layer and preparation thereof | Min Ho Jung, Ki Ho Baik | 2004-08-24 |
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Jae Chang Jung, Geun Su Lee, Ki Ho Baik | 2004-08-03 |
| 6770720 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Keun Kyu Kong, Min Ho Jung, Ki Ho Baik | 2004-08-03 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Geun Su Lee, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Jae Chang Jung +2 more | 2004-03-02 |