Issued Patents 2004
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824951 | Photoresist composition for resist flow process | Geun Su Lee, Jin-Soo Kim, Jae Chang Jung, Min Ho Jung | 2004-11-30 |
| 6818376 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Geun Su Lee, Jae Chang Jung | 2004-11-16 |
| 6811960 | Partially crosslinked polymer for bilayer photoresist | Geun Su Lee, Jae Chang Jung, Min Ho Jung | 2004-11-02 |
| 6808859 | ArF photoresist copolymers | Jae Chang Jung, Cheol Kyu Bok | 2004-10-26 |
| 6797451 | Reflection-inhibiting resin used in process for forming photoresist pattern | Sung-Eun Hong, Min Ho Jung, Hyeong Soo Kim, Jae Chang Jung | 2004-09-28 |
| 6780953 | Organic polymer for anti-reflective coating layer and preparation thereof | Min Ho Jung, Sung-Eun Hong | 2004-08-24 |
| 6770720 | Organic polymer for organic anti-reflective coating layer and preparation thereof | Jae Chang Jung, Keun Kyu Kong, Min Ho Jung, Sung-Eun Hong | 2004-08-03 |
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Geun Su Lee | 2004-08-03 |
| 6770415 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | Geun Su Lee, Cha-Won Koh, Jae Chang Jung, Min Ho Jung | 2004-08-03 |
| 6764806 | Over-coating composition for photoresist, and processes for forming photoresist patterns using the same | Jae Chang Jung, Keun Kyu Kong, Cha-Won Koh, Jin-Soo Kim | 2004-07-20 |
| 6753448 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Geun Su Lee, Jae Chang Jung | 2004-06-22 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Geun Su Lee, Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong +2 more | 2004-03-02 |
| 6692891 | Photoresist composition containing photo radical generator with photoacid generator | Jae Chang Jung, Geun Su Lee, Min Ho Jung | 2004-02-17 |