Issued Patents 2004
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6824951 | Photoresist composition for resist flow process | Jin-Soo Kim, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-11-30 |
| 6818376 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | Jae Chang Jung, Ki Ho Baik | 2004-11-16 |
| 6811960 | Partially crosslinked polymer for bilayer photoresist | Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-11-02 |
| 6806025 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | Jae Chang Jung, Ki Soo Shin | 2004-10-19 |
| 6770414 | Additive for photoresist composition for resist flow process | Min Ho Jung, Sung-Eun Hong, Jae Chang Jung, Ki Ho Baik | 2004-08-03 |
| 6770415 | Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same | Cha-Won Koh, Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-08-03 |
| 6753448 | Photoresist monomers, polymers thereof and photoresist compositions using the same | Jae Chang Jung, Ki Ho Baik | 2004-06-22 |
| 6753128 | Photoresist additive for preventing acid migration and photoresist composition comprising the same | Jae Chang Jung, Ki Soo Shin | 2004-06-22 |
| 6749990 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | Jae Chang Jung, Ki Soo Shin | 2004-06-15 |
| 6737217 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Jae Chang Jung, Ki Soo Shin | 2004-05-18 |
| 6720129 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | Jae Chang Jung, Ki Soo Shin | 2004-04-13 |
| 6699644 | Process for forming a photoresist pattern comprising alkaline treatment | Hyeong Soo Kim, Jin-Soo Kim, Cha-Won Koh, Sung-Eun Hong, Jae Chang Jung +2 more | 2004-03-02 |
| 6692891 | Photoresist composition containing photo radical generator with photoacid generator | Jae Chang Jung, Min Ho Jung, Ki Ho Baik | 2004-02-17 |
| 6686123 | Photoresist monomer, polymer thereof and photoresist composition containing the same | Jae Chang Jung, Min Ho Jung | 2004-02-03 |