Issued Patents 2004
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6806025 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | Geun Su Lee, Jae Chang Jung | 2004-10-19 |
| 6787285 | Pattern width slimming-inhibiting method of photoresist pattern using photoresist composition containing thermal acid generator | Keun Kyu Kong, Gyu-Dong Park, Jae Chang Jung | 2004-09-07 |
| 6764964 | Method for forming patterns of a semiconductor device | Young Sun Hwang, Jae Chang Jung, Sung Koo Lee, Chcol-kyu Bok | 2004-07-20 |
| 6753128 | Photoresist additive for preventing acid migration and photoresist composition comprising the same | Geun Su Lee, Jae Chang Jung | 2004-06-22 |
| 6749990 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | Jae Chang Jung, Geun Su Lee | 2004-06-15 |
| 6737217 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | Geun Su Lee, Jae Chang Jung | 2004-05-18 |
| 6720129 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | Geun Su Lee, Jae Chang Jung | 2004-04-13 |