TF

Toshiharu Furukawa

IBM: 10 patents #58 of 5,464Top 2%
📍 South Burlington, VT: #4 of 166 inventorsTop 3%
🗺 Vermont: #7 of 538 inventorsTop 2%
Overall (2004): #1,389 of 270,089Top 1%
10
Patents 2004

Issued Patents 2004

Showing 1–10 of 10 patents

Patent #TitleCo-InventorsDate
6821833 Method for separately optimizing thin gate dielectric of PMOS and NMOS transistors within the same semiconductor chip and device manufactured thereby Anthony I. Chou, Patrick R. Varekamp, Jeffrey W. Sleight, Akihisa Sekiguchi 2004-11-23
6818952 Damascene gate multi-mesa MOSFET Jack A. Mandelman, Byeongju Park 2004-11-16
6815737 Method for selective trimming of gate structures and apparatus formed thereby Mark C. Hakey, Steven J. Holmes, David V. Horak, Paul A. Rabidoux 2004-11-09
6797641 Gate oxide stabilization by means of germanium components in gate conductor Steven J. Holmes, Mark C. Hakey, David V. Horak 2004-09-28
6798017 Vertical dual gate field effect transistor Mark C. Hakey, Steven J. Holmes, David V. Horak, James M. Leas, William H. Ma +1 more 2004-09-28
6780720 Method for fabricating a nitrided silicon-oxide gate dielectric Jay Burnham, Anthony I. Chou, Margaret L. Gibson, James S. Nakos, Steven M. Shank 2004-08-24
6780736 Method for image reversal of implant resist using a single photolithography exposure and structures formed thereby Steven J. Holmes, Arpan Mahorowala, Dirk Pfeiffer 2004-08-24
6767789 Method for interconnection between transfer devices and storage capacitors in memory cells and device formed thereby Gary B. Bronner, David V. Horak, Jack A. Mandelman 2004-07-27
6759315 Method for selective trimming of gate structures and apparatus formed thereby Mark C. Hakey, Steven J. Holmes, David V. Horak, Paul A. Rabidoux 2004-07-06
6716647 Deliberate semiconductor film variation to compensate for radial processing differences, determine optimal device characteristics, or produce small productions runs Mark C. Hakey, Steven J. Holmes, David Horak 2004-04-06