Issued Patents 2003
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6559049 | All dual damascene oxide etch process steps in one confined plasma chamber | Lawrence Shao-hsien Chen, Chang-Tai Chiao, Young-Tong Tsai, Chuan-Kai Lo | 2003-05-06 |
| 6541361 | Plasma enhanced method for increasing silicon-containing photoresist selectivity | Sandy Chen, Charlie Lee | 2003-04-01 |