Issued Patents 2003
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6660644 | Plasma etching methods | Richard L. Stocks | 2003-12-09 |
| 6635335 | Etching methods and apparatus and substrate assemblies produced therewith | Rich Stocks | 2003-10-21 |
| 6630410 | Self-aligned PECVD etch mask | Shane J. Trapp | 2003-10-07 |
| 6617256 | Method for controlling the temperature of a gas distribution plate in a process reactor | Guy T. Blalock | 2003-09-09 |
| 6613189 | Apparatus for controlling the temperature of a gas distribution plate in a process reactor | Guy T. Blalock | 2003-09-02 |
| 6610212 | Method of forming high aspect ratio apertures | David S. Becker | 2003-08-26 |
| 6607987 | Method for improving uniformity in batch processing of semiconductor wafers | — | 2003-08-19 |
| 6602798 | Method and apparatus for reducing isolation stress in integrated circuits | Randhir P. S. Thakur, Zhiqiang Wu, Alan R. Reinberg | 2003-08-05 |
| 6582512 | Method of forming three-dimensional photonic band structures in solid materials | Joseph E. Geusic | 2003-06-24 |
| 6565721 | Use of heavy halogens for enhanced facet etching | Guy T. Blalock | 2003-05-20 |
| 6544895 | Methods for use of pulsed voltage in a plasma reactor | — | 2003-04-08 |
| 6516742 | Apparatus for improved low pressure inductively coupled high density plasma reactor | Guy T. Blalock | 2003-02-11 |
| 6511912 | Method of forming a non-conformal layer over and exposing a trench | Dinesh Chopra, Cem Basceri | 2003-01-28 |
| 6503410 | Method of modifying an RF circuit of a plasma chamber to increase chamber life and process capabilities | Guy T. Blalock | 2003-01-07 |