Issued Patents 2003
Showing 1–14 of 14 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6667135 | Method of manufacturing a photomask | Norio Hasegawa, Tsuneo Terasawa | 2003-12-23 |
| 6660438 | Method of manufacturing an electronic device and a semiconductor integrated circuit device | Norio Hasegawa | 2003-12-09 |
| 6656645 | Method of manufacturing a photomask | Norio Hasegawa, Tsuneo Terasawa | 2003-12-02 |
| 6656644 | Manufacturing method of photomask and photomask | Norio Hasegawa, Joji Okada, Kazutaka Mori, Ko Miyazaki | 2003-12-02 |
| 6653052 | Electron device manufacturing method, a pattern forming method, and a photomask used for those methods | Norio Hasegawa, Hiroshi Shiraishi, Hidetoshi Satoh | 2003-11-25 |
| 6645856 | Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate | Norio Hasegawa, Tsuneo Terasawa | 2003-11-11 |
| RE38296 | Semiconductor memory device with recessed array region | Noboru Moriuchi, Yoshiki Yamaguchi, Norio Hasegawa, Yoshifumi Kawamoto, Shin Kimura +2 more | 2003-11-04 |
| 6629051 | Defect inspection data processing system | — | 2003-09-30 |
| 6617265 | Photomask and method for manufacturing the same | Norio Hasegawa | 2003-09-09 |
| 6596656 | Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM | Norio Hasegawa, Kazutaka Mori, Ko Miyazaki, Tsuneo Terasawa | 2003-07-22 |
| 6580952 | System for controlling power plants and method for arranging the system | Hiroshi Fukuda, Masao Isshiki, Yuuichi Shibata, Kanetoshi Nara, Naomi Hattori | 2003-06-17 |
| 6576379 | Phaseshift mask and manufacturing the same | Norio Hasegawa | 2003-06-10 |
| 6558855 | Phase shift mask and manufacturing the same | Norio Hasegawa | 2003-05-06 |
| 6555295 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Shoichi Uchino, Naoko Asai | 2003-04-29 |