TT

Tsuneo Terasawa

HI Hitachi: 2 patents #899 of 4,225Top 25%
RT Renesas Technology: 2 patents #2 of 57Top 4%
📍 Yokohama, WA: #4 of 15 inventorsTop 30%
Overall (2003): #11,774 of 273,478Top 5%
4
Patents 2003

Issued Patents 2003

Showing 1–4 of 4 patents

Patent #TitleCo-InventorsDate
6667135 Method of manufacturing a photomask Toshihiko Tanaka, Norio Hasegawa 2003-12-23
6656645 Method of manufacturing a photomask Toshihiko Tanaka, Norio Hasegawa 2003-12-02
6645856 Method for manufacturing a semiconductor device using half-tone phase-shift mask to transfer a pattern onto a substrate Toshihiko Tanaka, Norio Hasegawa 2003-11-11
6596656 Manufacturing use of photomasks with an opaque pattern comprising an organic layer photoabsorptive to exposure light with wavelengths exceeding 200 NM Toshihiko Tanaka, Norio Hasegawa, Kazutaka Mori, Ko Miyazaki 2003-07-22