Issued Patents 2003
Showing 1–11 of 11 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6638143 | Ion exchange materials for chemical mechanical polishing | Yuchun Wang, Stan Tsai, Kapila Wijekoon, Fred C. Redeker | 2003-10-28 |
| 6632124 | Optical monitoring in a two-step chemical mechanical polishing process | Bret W. Adams, Boguslaw A. Swedek, Savitha Nanjangud, Andreas Norbert Wiswesser, Stan Tsai +3 more | 2003-10-14 |
| 6629881 | Method and apparatus for controlling slurry delivery during polishing | Fred C. Redeker, Frank Bose, A. Jason Whitby | 2003-10-07 |
| 6620027 | Method and apparatus for hard pad polishing | Ajoy Zutshi, Fred C. Redeker, Yutao Ma, Kapila Wijekoon | 2003-09-16 |
| 6602724 | Chemical mechanical polishing of a metal layer with polishing rate monitoring | Fred C. Redeker | 2003-08-05 |
| 6585574 | Polishing pad with reduced moisture absorption | Brian Lombardo | 2003-07-01 |
| 6569349 | Additives to CMP slurry to polish dielectric films | Yuchun Wang, Fred C. Redeker | 2003-05-27 |
| 6561873 | Method and apparatus for enhanced CMP using metals having reductive properties | Stan Tsai, Yuchun Wang, Kapila Wijekoon, Fred C. Redeker | 2003-05-13 |
| 6537144 | Method and apparatus for enhanced CMP using metals having reductive properties | Stan Tsai, Yuchun Wang, Kapila Wijekoon, Fred C. Redeker | 2003-03-25 |
| 6520840 | CMP slurry for planarizing metals | Yuchun Wang, Fred C. Redeker | 2003-02-18 |
| 6506097 | Optical monitoring in a two-step chemical mechanical polishing process | Bret W. Adams, Boguslaw A. Swedek, Savitha Nanjangud, Andreas Norbert Wiswesser, Stan Tsai +3 more | 2003-01-14 |