Issued Patents 2003
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6657726 | In situ measurement of slurry distribution | Yuchun Wang | 2003-12-02 |
| 6652355 | Method and apparatus for detecting an end-point in chemical mechanical polishing of metal layers | Andreas Norbert Wiswesser, Judon Tony Pan | 2003-11-25 |
| 6632124 | Optical monitoring in a two-step chemical mechanical polishing process | Bret W. Adams, Rajeev Bajaj, Savitha Nanjangud, Andreas Norbert Wiswesser, Stan Tsai +3 more | 2003-10-14 |
| 6607422 | Endpoint detection with light beams of different wavelengths | Andreas Norbert Wiswesser | 2003-08-19 |
| 6524165 | Method and apparatus for measuring substrate layer thickness during chemical mechanical polishing | Andreas Norbert Wiswesser, Walter Schoenleber | 2003-02-25 |
| 6506097 | Optical monitoring in a two-step chemical mechanical polishing process | Bret W. Adams, Rajeev Bajaj, Savitha Nanjangud, Andreas Norbert Wiswesser, Stan Tsai +3 more | 2003-01-14 |