Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6492073 | Removal of line end shortening in microlithography and mask set for removal | Burn Jeng Lin, Ru-Gun Liu, Shih-Ying Chen, Shinn-Sheng Yu, Hua-Tai Lin +1 more | 2002-12-10 |
| 6458689 | Use of PE-SiON or PE-Oxide for contact or via photo and for defect reduction with oxide and w chemical-mechanical polish | Chen-Hua Yu, Syun-Ming Jang, Tsu Shih, Jih-Chuyng Twu | 2002-10-01 |
| 6362093 | Dual damascene method employing sacrificial via fill layer | Syun-Ming Jang, Hung-Chang Hsieh | 2002-03-26 |