BL

Burn Jeng Lin

TSMC: 2 patents #107 of 614Top 20%
📍 Hsinchu, NY: #5 of 11 inventorsTop 50%
Overall (2002): #71,660 of 266,432Top 30%
2
Patents 2002

Issued Patents 2002

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6492073 Removal of line end shortening in microlithography and mask set for removal Ru-Gun Liu, Shih-Ying Chen, Shinn-Sheng Yu, Hua-Tai Lin, Anthony Yen +1 more 2002-12-10
6492077 Multiple-reticle mask holder and aligner 2002-12-10