Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6362093 | Dual damascene method employing sacrificial via fill layer | Syun-Ming Jang, Anthony Yen | 2002-03-26 |
| 6352818 | Photoresist development method employing multiple photoresist developer rinse | — | 2002-03-05 |
| 6350680 | Pad alignment for AlCu pad for copper process | Tsu Shih, Chen-Cheng Kuo | 2002-02-26 |