Issued Patents 2002
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6482566 | Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography | Donald C. Hofer, Scott A. MacDonald, Arpan Mahorowala, Robert D. Miller, Josef Michl | 2002-11-19 |
| 6444408 | High silicon content monomers and polymers suitable for 193 nm bilayer resists | Phillip Brock, Richard Anthony DiPietro, Donald C. Hofer, Ratnam Sooriyakumaran | 2002-09-03 |