AM

Arpan Mahorowala

IBM: 2 patents #982 of 5,400Top 20%
📍 West Linn, OR: #6 of 48 inventorsTop 15%
🗺 Oregon: #304 of 2,069 inventorsTop 15%
Overall (2002): #73,128 of 266,432Top 30%
2
Patents 2002

Issued Patents 2002

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
6482566 Hydroxycarborane photoresists and process for using same in bilayer thin film imaging lithography Donald C. Hofer, Scott A. MacDonald, Robert D. Miller, Josef Michl, Gregory Michael Wallraff 2002-11-19
6420084 Mask-making using resist having SIO bond-containing polymer Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee W. Kwong +3 more 2002-07-16