Issued Patents 2002
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6436820 | Method for the CVD deposition of a low residual halogen content multi-layered titanium nitride film having a combined thickness greater than 1000 å | Jianhua Hu, Yin Lin, Yehuda Demayo, Ming Xi | 2002-08-20 |
| 6364949 | 300 mm CVD chamber design for metal-organic thin film deposition | David T. Or, Keith Kuang-Kuo Koai, Lawrence Chung-Lai Lei | 2002-04-02 |
| 6352620 | Staged aluminum deposition process for filling vias | Sang Ho Yu, Yonghwa Chris Cha, Murali Abburi, Shri Singhvi | 2002-03-05 |