Issued Patents 1997
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5665608 | Method of aluminum oxide low pressure chemical vapor deposition (LPCVD) system-fourier transform infrared (FTIR) source chemical control | Jonathan D. Chapple-Sokol, James A. O'Neill, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong | 1997-09-09 |
| 5648113 | Aluminum oxide LPCVD system | Steven G. Barbee, Jonathan D. Chapple-Sokol, Richard Hsiao, James A. O'Neill, Narayana V. Sarma +3 more | 1997-07-15 |
| 5614247 | Apparatus for chemical vapor deposition of aluminum oxide | Steven G. Barbee, Alexander Kostenko, Narayana V. Sarma, Donald L. Wilson, Justin W. Wong +1 more | 1997-03-25 |
| 5603988 | Method for depositing a titanium or tantalum nitride or nitride silicide | Michael J. Shapiro, Ravi Kanjolia, Ben C. Hui, Paul F. Seidler, Karen L. Holloway +1 more | 1997-02-18 |