Issued Patents 1997
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5688893 | Method of using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Daniel P. Aubin, Ralph R. Dammel | 1997-11-18 |
| 5665517 | Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom | M. Dalil Rahman, Daniel P. Aubin, Elaine G. Kokinda | 1997-09-09 |
| 5652297 | Aqueous antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Ping-Hung Lu, Ming Kang, Dinesh N. Khanna +1 more | 1997-07-29 |
| 5652317 | Antireflective coatings for photoresist compositions | Iain McCulloch, Ralph R. Dammel, Ping-Hung Lu | 1997-07-29 |
| 5646218 | Novolak resin blends for photoresist applications | Thomas J. Lynch, Chester J. Sobodacha | 1997-07-08 |
| 5624789 | Metal ion reduction in top anti-reflective coatings for photoresisis | M. Dalil Rahman | 1997-04-29 |
| 5614349 | Using a Lewis base to control molecular weight of novolak resins | M. Dalil Rahman, Daniel P. Aubin, Ralph R. Dammel | 1997-03-25 |
| 5594098 | Metal ion reduction in novolak resins and photoresists | M. Dalil Rahman | 1997-01-14 |