MR

M. Dalil Rahman

HC Hoechst Celanese: 9 patents #1 of 155Top 1%
📍 Flemington, NJ: #1 of 59 inventorsTop 2%
🗺 New Jersey: #16 of 4,679 inventorsTop 1%
Overall (1997): #761 of 185,788Top 1%
9
Patents 1997

Issued Patents 1997

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
5693749 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom Daniel P. Aubin, Dinesh N. Khanna, Sunit S. Dixit 1997-12-02
5688893 Method of using a Lewis base to control molecular weight of novolak resins Daniel P. Aubin, Dana L. Durham, Ralph R. Dammel 1997-11-18
5686561 Metal ion reduction in novolak resin solution using an anion exchange resin 1997-11-11
5665517 Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom Daniel P. Aubin, Elaine G. Kokinda, Dana L. Durham 1997-09-09
5656413 Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom Daniel P. Aubin 1997-08-12
5624789 Metal ion reduction in top anti-reflective coatings for photoresisis Dana L. Durham 1997-04-29
5614352 Metal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resin 1997-03-25
5614349 Using a Lewis base to control molecular weight of novolak resins Daniel P. Aubin, Dana L. Durham, Ralph R. Dammel 1997-03-25
5594098 Metal ion reduction in novolak resins and photoresists Dana L. Durham 1997-01-14