RD

Ralph R. Dammel

HC Hoechst Celanese: 4 patents #4 of 155Top 3%
Hoechst Gmbh: 1 patents #243 of 721Top 35%
📍 Shizuoka, RI: #1 of 1 inventorsTop 100%
Overall (1997): #3,606 of 185,788Top 2%
5
Patents 1997

Issued Patents 1997

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
5688893 Method of using a Lewis base to control molecular weight of novolak resins M. Dalil Rahman, Daniel P. Aubin, Dana L. Durham 1997-11-18
5652297 Aqueous antireflective coatings for photoresist compositions Iain McCulloch, Dana L. Durham, Ping-Hung Lu, Ming Kang, Dinesh N. Khanna +1 more 1997-07-29
5652317 Antireflective coatings for photoresist compositions Iain McCulloch, Dana L. Durham, Ping-Hung Lu 1997-07-29
5614349 Using a Lewis base to control molecular weight of novolak resins M. Dalil Rahman, Daniel P. Aubin, Dana L. Durham 1997-03-25
5614351 Radiation-curable mixture, and radiation-sensitive recording material produced therefrom for high-energy radiation Juergen Lingnau, Georg Pawlowski, Juergen Theis 1997-03-25