DA

Daniel P. Aubin

HC Hoechst Celanese: 5 patents #3 of 155Top 2%
📍 Rockville, RI: #1 of 1 inventorsTop 100%
🗺 Rhode Island: #3 of 391 inventorsTop 1%
Overall (1997): #4,770 of 185,788Top 3%
5
Patents 1997

Issued Patents 1997

Showing 1–5 of 5 patents

Patent #TitleCo-InventorsDate
5693749 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom M. Dalil Rahman, Dinesh N. Khanna, Sunit S. Dixit 1997-12-02
5688893 Method of using a Lewis base to control molecular weight of novolak resins M. Dalil Rahman, Dana L. Durham, Ralph R. Dammel 1997-11-18
5665517 Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom M. Dalil Rahman, Elaine G. Kokinda, Dana L. Durham 1997-09-09
5656413 Low metal ion containing 4,4'-[1-[4-[1-(4-Hydroxyphenyl)-1-methylethyl]phenyl]ethylidene]bisphe nol and photoresist compositions therefrom M. Dalil Rahman 1997-08-12
5614349 Using a Lewis base to control molecular weight of novolak resins M. Dalil Rahman, Dana L. Durham, Ralph R. Dammel 1997-03-25